Investigate the Structural and Optical Properties of RF-Sputtered V2O5 thin films deposited at different Power
Article Sidebar
Main Article Content
Abstract
In this work, the structural and optical properties of V2O5 have been presented. Thin films were manufactured by the RF magnetron sputtering process. The nanostructures and some optical properties of deposit thin films at different sputtering RF power in a plasma chamber were investigated. The structural investigation was performed with X-Ray Diffraction (XRD) measurements and Atomic Force Microscopy (AFM). The results obtained from both methods have revealed that as-deposited films were polycrystalline in nature. The texture of the films was observed that , the crystallite and grain size were increased with increasing the sputtering power. Optical properties were determined by transmission measurements in the spectral range from (250 to 1100 nm) . An Optical energy gap of sputtered films and its dependency to sputtering power of plasma have been measured. It was found that the energy gap decreased with increasing the used power. The energy band gap was found to be in the ranged of (3.02 eV to 2.90 eV) when the sputtering power varying from (75 nm to 150 Watt).
Article Details
This work is licensed under a Creative Commons Attribution 4.0 International License.
Tikrit Journal of Pure Science is licensed under the Creative Commons Attribution 4.0 International License, which allows users to copy, create extracts, abstracts, and new works from the article, alter and revise the article, and make commercial use of the article (including reuse and/or resale of the article by commercial entities), provided the user gives appropriate credit (with a link to the formal publication through the relevant DOI), provides a link to the license, indicates if changes were made, and the licensor is not represented as endorsing the use made of the work. The authors hold the copyright for their published work on the Tikrit J. Pure Sci. website, while Tikrit J. Pure Sci. is responsible for appreciate citation of their work, which is released under CC-BY-4.0, enabling the unrestricted use, distribution, and reproduction of an article in any medium, provided that the original work is properly cited.
References
[1] Granqvist, C. G. et al. (2010). Chromogenics for Sustainable Energy: Some Advance in Thermochromics and Electrochromics. Advances in Science and Technology, 75(5): 55-64.
[2] Fujita, Y.; Miyazaki, K. and Tatsuyama, T. (1985). On the Electrochromism of Evaporated V2O5 Films. Japanese Journal of Applied Physics, 24(1): 1082-1087.
[3] Sieradzka, K. et al. (2011). Structural and optical properties of vanadium oxides prepared by microwave-assisted reactive magnetron sputtering. Journal of Materials Chemistry, 41(2): 463-469.
[4] Mousavi, M.; Kompany, A.; Shahtahmasebi, N. and Bagheri Mohagheghi, M. (2013). Study of structural, electrical and optical properties of vanadium oxide condensed films deposited by spray pyrolysis technique. Advanced Manufacture, 1(4): 320-328.
[5] Umadevi, C. L.; Nagendra, G. K. and Thutupalli, M. (1993). Structural, electrical and infrared optical properties of vanadium pentoxide (V2O5) thick-film thermistors. Sensors and Actuators A: Physical, 39(1): 59-69.
[6] Hullavarad, N. V. et al. (2008). Electrical and optical properties of V2O5 micro-nano structures grown by direct vapor phase deposition method. Journal of the Electrochemical Society, 155(4): K84-K89.
[7] Ramana, C. V.; Smith, R. J.; Hussain, O. M. and Chusuei, C. C. (2005). Correlation between growth conditions, microstructure, and optical properties in pulsed-laser-deposited V2O5 thin films. Chemistry of Materials, 17(5): 1213-1219.
[8] Patrissi, C. J. and Martin, C. R. (1999). Sol-gel-based template synthesis and Li-insertion rate performance of nanostructured vanadium pentoxide. Journal of the Electrochemical Society, 146(9): 3176-3180.
[9] Santos, R. et al. (2013). Thermoelectric properties of V2O5 thin films deposited by thermal evaporation. Applied Surface Science, 282(0): 590-594.
[10] Perednis, D. and Gauckler, L. J.(2005). Thin film deposition using spray pyrolysis. Journal of electroceramics, 14(2): 103-111.
[11] Liu, D. and Garcia, B. B. (2009). V2O5 xerogel electrodes with much enhanced lithium-ion intercalation properties with N2 annealing. Journal of Materials Chemistry, 19(46): 8789-8795.
[12] Beke, S. et al. (2008). Structural and optical properties of pulsed laser deposited V2O5 thin films. Journal of the Electrochemical Society, 516(15): 4659-4664.
[13] Julien, C. et al. (1999). Growth of V2O5 thin films by pulsed laser deposition and their applications in lithium microbatteries. Materials Science and Engineering: B, 65(3): 170-176.
[14] Kumar, R. T. et al. (2003). Properties of pulsed laser deposited vanadium oxide thin film thermistor. Materials Science in Semiconductor Processing, 6(5–6): 375-377.
[15] Fateh, N. et al. (2008). Synthesis-structure relations for reactive magnetron sputtered V2O5 films. Surface and Coatings Technology, 202(8): 1551-1555.
[16] Schoiswohl, J. and Surne, S. v. (2004). Planar vanadium oxide clusters: Two - dimensional evaporation and diffusion on Rh(111). Indian Journal of Physics, 92(20): 206103-1.
[17] Ramana, C. V.; Smith. R. J. and Hussain. O. M. (2003). Grain size effects on the optical characteristics of pulsed-laser deposited vanadium oxide thin films. Physica Status Solidi (A) Applied Research, 199(1): R4.
[18] Ramana, C. V.; Hussain, O. M.; Naidu, B. S. and Julien. C. (1998). Physical investigations on electron-beam evaporated vanadium pentoxide films. Materials Science and Engineering B, 52(1): 32.
[19] Srikant, V. and Clarke, D. R. (1998). On the optical band gap of zinc oxide. Journal of Applied Physics, 83(10): 5447-5451.
[20] Schubert, E. F. et al. (2007). Optical thin-film materials with low refractive index for broadband elimination of Fresnel reflection. Journal of Optoelectronics and Biomedical Materials, 1(3): 176-179.