Study the structural and Optical properties of ZnO thin film
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Abstract
This research included preparation of ZnO thin films from Zinc acetate solution (Zn(CH3COO)22H2O). on glass substrate with dimension (2.5cmx2.5cmx0.1cm) using chemical spray pyrolysis method composed with (0.2M). The structural properties were characterized by X-Ray diffraction (XRD), Atomic force microscope (AFM), Scanning electron microscope (SEM) and Energy dispersive of X-Ray (EDX). The film grown have a polycrystalline wurtizte structure it can be seen that the highest texture coefficient was in (002) plane. So (AFM) measurement show that the roughness average (1.51nm), root mean square (RMS = 1.75nm) and dimeter average (108.96nm). The optical properties were characterized by (UV- Visible) and showed that higher transmittance about (97%) and optical Energy gab (Eg=3.28 eV).
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References
1) K.D. Lever, "Thin Fillms", London (1972).
2) L. Eckrtova,"physics of Thin Fillms", plenum press, New York (1977).
3) K.L. Chopra, "Thin Fillm Devices Application", pleum press, New York (1983) .
4) R. Ueda and J. B. Millin, "Crystal Growth and Characterization", Mc Graw-Hill, (1975).
5) G. Hass and R. E. Thun, "Physics of thin Films”, Academic Press, New York, (1966).
6) B.A. Abbas, “The Effect of Annealing on The Structural and Optical Properties of (ZnO) Thin Films ”, M.Sc. Thesis , University of Baghdad , (2009).
7) M. Bouderbala, S. Hamzaoui, B. Amrani, A.H. Reshak, M. Adnane, T. Sahraoui, and M. Zerdali, “ Thickness Dependence of Structural, Electrical and Optical Behavior of Undoped ZnO Thin Films”, Physica B, Vol. 403, pp. 3326-3330, (2008).
8) Ali. A-K.Hussain, kadhim A. Aadim, Hiba M. Salman, ''structure and optical propreties of ZnO doped Mg Thin films deposited by pulse laser'', Iraqi Journal of physics, vol. 12,No.25,PP.56-61, (2014)
9) Elanchezhiyan, J., Shin, B.C., Lee, W.J., Park, S.H. and Kim, S.C., Cryst. Res. Technol., 44(12) 1319, (2009)
10) Xiaming, Z., Huizhen, W., Shuangjiang, W., Yingying, Z., Chunfeng, C., Jianxiao, S., Zijian, Y., Xiaoyang, D. and Shurong, D., Journal of Semiconductors, 30(3) 1, (2009)
11) Hasan Afifi, Mohamad Abdel-Naby, Said El-Hefnawie, Aref Eliewa, Ninet Ahmad, '' Optical and Electrical Properties of Zinc Oxide Films Prepared by Spray Pyrolysis'', Iraqi journal of applied physics, (2010).
12) Bhavana Godbole, Nitu Badera, Shyambihari Shrivastava, Deepti Jain, Vganesan Ganesan," Growth Mechanism of ZnO Films Deposited by Spray Pyrolysis Technique", Materials Sciences and Applications, , 2, 643-648, (2011).
13) Nadia Chahmat, Ammar Haddad, Azzedine Ain-Souya, Rachid Ganfoudi, Nadir Attaf, Mouhamed Salah Aida, Mokhtar Ghers, " Effect of Sn Doping on the Properties of ZnO Thin Films Prepared by Spray Pyrolysis", Journal of Modern Physics, , 3, 1781-1785, (2012).
14) M.Ohring "The Materials Science of thim films'' Book, Academicpress, (1992).
15) N. Shakti "structural and optical propertien of Sol-gel prepared ZnO thin film" J. Applid physis Research, Vol.2, No.1, pp. (19-28) ,(2010).
16) Ladislav Nádherný, Zdeněk Sofer, David Sedmidubský, Ondřej Jankovský, Martin Mikulics," ZnO thin films prepared by spray-pyrolysis technique from organo-metallic precursor", Peter Grünberg Institute (PGI-9), Forschungszentrum Jülich, D-52425 Jülich, Germany, 6(2012).
17) S. ILICAN, Y. CAGLAR, M. CAGLAR, B. DEMIRCI," Polycrystalline indium-doped ZnO thin filmsو preparation and characterization", JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS Vol. 10, No. 10, October, p. 2592 – 2598, (2008).
18) J. M. Pawlikowski, "Thin solid film",Vol.127, pp.9-27, (1985).
19) M.CAGLAR, Y.CAGLAR and S.ILCAN " The determination of the thickness and optical constants of the ZnO Ceystalline thin film by using envlope method" J.Optoelectronics and Advanced Materals ,Vol .8, No.4, pp.(1410- 1413), (2006).
20) Physics Of Semiconductors ", B. Saporal and C. Herman Springer Valoy , New Yourk, Inc, (1995).
21) S. S. Al. Rawis. J. Shaker, Y. M. Hassan, Solid State Physi, Almoustansrea University , (1990).
22) D. C. Atamirano, G. Torres, R. Castandeo, O. Jimeuz, and J. ImenezSuper Ficies, Vol. 13, P. 66, (2001).